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Suppliers > target > Fujian Acetron New Materials CO. , Ltd | Matching Products

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(1-5 out of 5)

Planar Alloy Sputtering Target: Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Ceramic Sputtering Target: Rotary Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very ...

Rotary Metal Sputtering Targets: Rotary Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high ...

Planar Metal Sputtering Targets: Planar Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high ...

Planar Ceramic Sputtering Target: Planar Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very ...

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Planar Alloy Sputtering Target